Subwavelength photolithography based on surface-plasmon polariton resonance

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Subwavelength photolithography based on surface-plasmon polariton resonance.

The use of surface-plasmon polariton (SPP) resonance in the optical near field of a metallic mask to produce fine patterns with a resolution of subwavelength scale is proposed. Preliminary numerical simulations indicate that the critical resolution is mainly determined by the thickness of the metallic mask. The surface of the metallic mask on the illuminated side collects light through SPP coup...

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ژورنال

عنوان ژورنال: Optics Express

سال: 2004

ISSN: 1094-4087

DOI: 10.1364/opex.12.003055